Use of tetramethylamine hydroxide

Four methyl hydrogen amine oxide Tetramethylammoniumhydroxide (English) and called the four methyl ammonium hydroxide, tetramethyl ammonium hydroxide, is strong organic alkali, no color, odourless, easy be affected with damp be affected with damp, the gas can quickly digest absorb carbon dioxide, the indoor temperature lower saturated vapor pressure, It is dissolved and vaporized at 135~145℃, and the high pure product is solved at 140℃ at ultra-low temperature without a small amount of sediment. Tetramethylamine hydrooxide solution has no color, fully transparent and slightly ammonia odor, 1(wt)% solution PH value of 12.9, is as strong acid as caustic alkali compressive strength. The aqueous solution was concentrated under pressure relief to obtain 5 water-absorbing fiber crystals of water of crystal, and then concentrated again and dedried into 3 crystals of water of crystal, and then into 1 water of crystal of tetramethylammonium hydroxide, which was dissolved into trimethylamine and dimethyl ether at 135 ~ 140℃, generally 10% and 25% aqueous solutions.

The main purpose

The products on the world market are mainly divided into two categories: industrial production grade and electronic device grade.

Industrial production in industrial production is the main purpose of general industry, such as the production of organic silicon series products of metal catalysts, as dimethyl methyl silicone oil, benzyl methyl silicone oil, silicone material diffusion pump oil, active solvent coating silicone rubber molding, silicone resin, silicone metal catalysts, such as after the advantage is reflected the heating temperature, It can be dissolved into vapor and driven away without remaining in the product. Polyester aggregation, textiles, plastic products and leather products and other industries.

The electronic device grade is a solution of tetramethyl ammonium hydroxide and water, and the appearance is a transparent solution without color. In the electronic industry, it is the key to be used as the lithography imaging agent for printed circuit boards, the etching processing agent for silicon wafers and the cleaning agent in the manufacturing of microelectronic technology chips.

At the level of analysis, it is used as a reagent for spectrum experiment, and at the level of product purification, it is used as a free alkali for deposition of many chemical elements. In the production and manufacture of organic chemical monocrystalline silicon sheets, it is often used as polishing fluid, cleaning agent and lithography agent for computer silicon sheets.